Rutgers Computer & Technology Law Journal: Volume 41, Number 1 - 2015 - E-book - ePub

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Rutgers Computer & Technology

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 Rutgers Computer & Technology - Rutgers Computer & Technology Law Journal: Volume 41, Number 1 - 2015.
The Rutgers Computer & Technology Law Journal now offers its issues in convenient and modern ebook formats for e-reader devices, apps, pads, smartphones,... Lire la suite
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Résumé

The Rutgers Computer & Technology Law Journal now offers its issues in convenient and modern ebook formats for e-reader devices, apps, pads, smartphones, and computers. This first issue of Volume 41, 2015, features new articles and student contributions on cutting-edge topics related to: teleradiology, jurisdiction, and malpractice; teaching 'next gen' research methods such as Ravel and Casetext to law students; regulating 3D-printing as firearms creators; employment, privacy, and social media; and privacy issues of cell phone tracking.
In the new ebook edition, quality presentation includes active TOC, linked notes, active URLs in notes, proper digital and Bluebook formatting, and inclusion of images and tables from the original print edition. The Journal is edited and produced by students at Rutgers University School of Law - Newark and features contributions by leading scholars and professionals in the field. Founded in 1969, the Journal is the oldest computer law periodical in the academic world.
Since its inception, the Journal has maintained a tradition of excellence, and has designed each publication issue to foster critical discourse on the technological breakthroughs impacting the legal landscape.

Caractéristiques

  • Date de parution
    17/02/2015
  • Editeur
  • ISBN
    978-1-61027-847-8
  • EAN
    9781610278478
  • Format
    ePub
  • Caractéristiques du format ePub
    • Protection num.
      pas de protection

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Biographie de Rutgers Computer & Technology

The Rutgers Computer & Technology Law Journal (sometimes called CompTech) is edited and produced by students at Rutgers University School of Law - Newark and features contributions by leading scholars and professionals in the field.

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