Plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments,...
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Résumé
Plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. An international team of authors presents most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.
Sommaire
Characteristics of low-temperature plasmas under non-thermal conditions: a short summary
Electron kinetics in weakly ionized plasmas
Elementary collision processes in plasmas
Fundamental processes in plasma-surface interactions
Modeling of plasma-wall interaction
Langmuir probe diagnostics of low-temperature plasmas
Diagnostics of non-equilibrium molecular plasmas using emission and absorption spectroscopy
Mass spectrometric diagnostics
Ellipsometric analysis of plasma-treated surfaces
Characterization of thin solid films
Plasma sources
Reactive non-thermal plasmas; chemical quasi-equilibria, similarity principles and macroscopic kinetics
High-pressure plasmas: dielectric-barrier and corona discharges; properties and technical applications